Advanced Energy to Introduce Three New Process Power Products During SEMICON West 2020

AE announces a revolutionary plasma process power system and expands the capabilities of its leading solid-state match and integrated RF generator and match solution

 

DENVER, COLORADO – Media OutReach – 3 August
2020 – Advanced Energy (Nasdaq: AEIS) — a
global leader in highly engineered, precision power conversion, measurement and
control solutions — today announced it unveiled three new solutions for
advanced technology node semiconductor wafer processing.

“Semiconductor
manufacturing is growing and rapidly transforming with the rise of the 4^th
Industrial Revolution. AE is at the forefront with power solutions that enable
smaller features, faster processes, tighter control and lower cost of ownership,
which our customers rely on to make the chips that fuel the data economy,” said
Peter Gillespie, vice president and general manager, semiconductor, Advanced
Energy. “Formerly almost hidden from view, process power is now increasingly
recognized as a critical enabler in wafer processing. We look forward to
sharing our products that ‘power the process’ as well as exhibiting, for the first
time, products that ‘power the platform’ with AE’s Artesyn Embedded Power portfolio of offerings.”

AE introduces valuable new
system solutions that change how plasma processes are powered:

eVoS™ LE: AE introduces its eVoS platform,
a wholly new non-sinusoidal
plasma power technology that enables tightly targeted ion energy control,
which is increasingly important for advanced etch and deposition processes used
to create leading-edge device features at 5nm and below. Providing an
alternative to conventional sinusoidal RF bias plasma power that uses complex
multi-frequency systems, eVoS is designed to produce customized narrow ion
energy distributions in a singular solution. AE’s solution enables more direct
control of ion energy distributions, better bias power efficiency and less
power loss than conventional solutions, all benefits necessary to create increasingly
challenging 3D IC features. eVoS LE (Low Energy) offers precise power control
for critical plasma-based applications, such as atomic layer etch (ALE), etch,
clean, deposition and atomic layer deposition (ALD).

Navigator^® II FCi: Building on the success of its industry-leading
Navigator II impedance matching network platform, AE introduces Navigator II
FCi, a new, faster solid-state matching network that improves value, speed and
tune range compared to standard matching network products. Based on high
speed PIN-diode technology, Navigator II FCi complements AE’s first-to-market
Navigator II FastCap™ solid-state match, broadening the power and impedance
range and improving response times to sub-milliseconds. With
no moving parts, the Navigator II FCi’s reliability and reproducibility exceed
that of traditional vacuum capacitor matches. The Navigator II FCi is available to enable advanced ALE
applications with capabilities extended to support an ever-broadening range of
applications to meet new market requirements. The Navigator II FCi high-speed
PIN-diode technology is also now available in the novel integrated match and
generator RF power delivery system, Paramount HFi.

Paramount^® HFi:
The benefits of a high performance, low cost integrated RF
power system come in Paramount HFi’s small footprint, meeting the stringent
requirements of today’s most advanced deposition tools. AE developed the industry’s
first commercially viable, fully integrated generator and match delivery system
in 2000 with its Apex product. Apex remains a deposition RF power workhorse, capable
of switching between four discrete tune range positions. The new Paramount HFi
substantially extends this concept with 32 tune range positions, an upgraded
fully digital control system and a new VI (RF metrology) sensor. With these new
capabilities and its widened operating window, the Paramount HFi provides advanced
process control, high repeatability, a common exciter mode to synchronize
multiple systems in cluster configurations and advanced communication protocol
(EtherCAT). The Paramount HFi’s compact size, millisecond response times and
high reliability make it ideal for today’s short duration deposition process
steps, and where speed and reliability are increasingly viewed as critical enablers
in processing advanced NAND and other high repetition stack devices.

For detailed technical specifications,
visit www.advancedenergy.com.

About Advanced Energy

Advanced
Energy (Nasdaq: AEIS) is a global leader in the design and manufacturing of
highly engineered, precision power conversion, measurement and control
solutions for mission-critical applications and processes. AE’s power solutions
enable customer innovation in complex applications for a wide range of
industries including semiconductor equipment, industrial, manufacturing,
telecommunications, data center computing and healthcare. With engineering
know-how and responsive service and support around the globe, the company
builds collaborative partnerships to meet technology advances, propel growth
for its customers and innovate the future of power. Advanced Energy has devoted
more than three decades to perfecting power for its global customers and is
headquartered in Denver, Colorado, USA. For more information, visit www.advancedenergy.com.  

Advanced
Energy | Precision. Power. Performance.